A new special issue in Advanced Materials Interfaces this month highlights advances in “Atomic Layer Deposition for Energy and Environmental Applications”, guest edited by Neil P. Dasgupta, Liang Li, and Xueliang Sun. This special issue includes four reviews, one progress report, and eleven research articles covering application of atomic layer deposition technique for photovoltaics, energy storage, capacitors and conductors, sensors, etc. The articles reflect the breadth of the atomic and molecular layer deposition techniques for surface and interfacial modification, and demonstrate the precise control of composition and structure at the nanoscale afforded by their selflimiting chemistry.
Find the comprehensive collection of articles below:
Editorial by Neil P. Dasgupta, Liang Li, and Xueliang Sun
Advances in the Application of Atomic Layer Deposition for Organometal Halide Perovskite Solar Cells
Kaimo Deng and Liang Li
Atomic Layer Deposition for Lithium-Based Batteries
Lu Ma, Ramsay B. Nuwayhid, Tianpin Wu, Yu Lei, Khalil Amine, and Jun Lu
Molecular Layer Deposition for Surface Modification of Lithium-Ion Battery Electrodes
Chunmei Ban and Steven M. George
Atomic Layer Deposition to Materials for Gas Sensing Applications
Catherine Marichy and Nicola Pinna
Atomic Layer Deposition for Sensitized Solar Cells: Recent Progress and Prospects
Do Han Kim, Mark D. Losego, Qing Peng, and Gregory N. Parsons
Jian Liu, Biqiong Wang, Qian Sun, Ruying Li, Tsun-Kong Sham, and Xueliang Sun
Qiong Liu, Fengren Cao, Fangli Wu, Hao Lu, and Liang Li
Suk Won Park, Kiho Bae, Jun Woo Kim, Gyeong Beom Lee, Byoung-Ho Choi, Min Hwan Lee, and Joon Hyung Shim
Biqiong Wang, Jian Liu, Qian Sun, Biwei Xiao, Ruying Li, Tsun-Kong Sham, and Xueliang Sun
Katherine E. Roelofs, Vanessa L. Pool, Dara A. Bobb-Semple, Axel F. Palmstrom, Pralay K. Santra, Douglas G. Van Campen, Michael F. Toney, and Stacey F. Bent
Ricardo M. Silva, Guylhaine Clavel, Yafei Fan, Patrick Amsalem, Norbert Koch, Rui F. Silva, and Nicola Pinna
James S. Daubert, J. Zachary Mundy, and Gregory N. Parsons
Huanwen Wang, Guichong Jia, Yuanyuan Guo, Yongqi Zhang, Hongbo Geng, Jing Xu, Wenjie Mai, Qingyu Yan, and Hong Jin Fan
Chuan-Fu Lin, Alexander C. Kozen, Malachi Noked, Chanyuan Liu, and Gary W. Rubloff
Sequential Regeneration of Self- Assembled Monolayers for Highly Selective Atomic Layer Deposition
Fatemeh Sadat, Minaye Hashemi, and Stacey F. Bent
Zhengning Gao, Yoon Myung, Xing Huang, Ravi Kanjolia, Jeunghee Park, Rohan Mishra, and Parag Banerjee